Zhou, W. and Huang, Y. and Menard, E. and Aluru, N. R. and Rogers, J. A. and Alleyne, A. G.. (2005) Mechanism for stamp collapse in soft lithography. Applied Physics Letters, 87 (25). p. 251925. ISSN 00036951
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Official URL: http://dx.doi.org/10.1063/1.2149513
| Item Type: | Article |
|---|---|
| InterNano Taxonomy: | Nanomanufacturing Processes > Nanopatterning/Lithography |
| Collections: | Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for High-rate Nanomanufacturing Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for Nanoscale Chemical-Electrical-Mechanical Manufacturing Systems |
| Depositing User: | Amulya Gullapalli |
| Date Deposited: | 21 Jul 2011 19:34 |
| Last Modified: | 19 Sep 2011 21:39 |
| URI: | http://eprints.internano.org/id/eprint/1453 |
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