The NNN Newsletter
We'd like to thank all of our participants and attendees for making the first Nanomanufacturing Summit a successful event!
Overviews of the talks
and sessions for each day have been posted on InterNano.
In addition, the complete
event program (PDF), presentation
abstracts and many of the presentations
are available for viewing and downloading from the Summit website.
The Summit student poster
session (PDF) can also be viewed, along with the announcement
of the Student Poster Competition winners.
The Nanomanufacturing Summit 2009 held in Boston from May 27 to 29 brought together experts in the field of and nanomanufacturing and highlighted innovative academic, government and industry research, successful commercialization strategies, and challenges and approaches for bridging the gap between the laboratory and the production floor. Summit participants represented multi-disciplinary areas of expertise in physical, environmental, and health sciences, government and regulation, as well as commercial manufacturing and entrepreneurship. Throughout the 3-day event attendees heard about those areas of practice that stand out from the general nanotechnology and nanoscience themes as addressing near-term issues and having the potential to facilitate the commercial development and marketable application of nanoscale systems and devices.
Jeff Morse, Managing Director,
National Nanomanufacturing Network
Learn more about the NNN...
Funding Innovations for Critical National Need
The previously announced Technology Innovation Program (TIP) by the National Institute of Standards and Technology (NIST) presently provides competition for multiyear research funding in two major areas of national interest--civil infrastructure and manufacturing. With this technology focus TIP anticipates providing cost-shared funding for approximately 25 new R&D projects.
Helium Ion Microscope for Precision Lithography
David C. Bell, Max C. Lemme, and colleagues at Harvard and MIT report the use of a Helium Ion Beam microscope configured for lithography to etch graphene devices with sub-20nm feature sizes. As a direct-write process, helium ion lithography bypasses the need for resists or other materials to come in contact with the graphene, allowing the devices to be fabricated cleanly and without damage.
Functional Self Assembly Incorporating Quantum Dot-Block Copolymer Hybrids
Quantum dot-block copolymer hybrids offer a means for increasing the solubility and stability of inorganic nanoparticles. More importantly, appropriate surface functionalization of the polymer hybrid enables a direct linkage between organic and semiconducting materials to the inorganic core--meaning that custom polymer blocks can assemble the necessary hierarchy to optimize material properties for specific applications. Zorn, et.al., report their investigation of QD-BCP hybrids for improving the properties of QD light emitting diodes (QLEDs). More...
Read more on
June 22 - 23, 2009
Nano Rewable Energy Summit
June 24-25, 2009
UK SPM 2009
June 23 - 26, 2009
2009 International Conference on Nanotechnology for the Forest Products Industry
June 25 - 26, 2009
Biodetection Technologies 2009
From Our Affiliates
Mechanochemical Delivery and Dynamic Tracking of Fluorescent Quantum
Dots in the cytoplasm and Nucleus of Living Cells
Nano Letters 9(5):2193-2198
First-principles theoretical analysis of pure and hydrogenated crystalline carbon phases and nanostructures
Chemical Physics Letters 474(1-3):168-174
A Simple Top-Down/Bottom-Up Approach to Sectored, Ordered Arrays
of Nanoscopic Elements Using Block copolymers