Huang, Yonggang Y. and Zhou, Weixing and Hsia, K. J. and Menard, Etienne and Park, Jang-Ung and Rogers, John A. and Alleyne, Andrew G.. (2005) Stamp Collapse in Soft Lithography. Langmuir, 21 (17). p. 8058. ISSN 0743-7463
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Official URL: http://dx.doi.org/10.1021/la0502185
| Item Type: | Article |
|---|---|
| InterNano Taxonomy: | Nanomanufacturing Processes > Nanopatterning/Lithography |
| Collections: | Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for Nanoscale Chemical-Electrical-Mechanical Manufacturing Systems |
| Depositing User: | Amulya Gullapalli |
| Date Deposited: | 21 Jul 2011 17:12 |
| Last Modified: | 21 Jul 2011 17:12 |
| URI: | http://eprints.internano.org/id/eprint/1483 |
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