Xiong, Yi and Liu, Zhaowei and Zhang, Xiang. (2009) A simple design of flat hyperlens for lithography and imaging with half-pitch resolution down to 20 nm. Applied Physics Letters, 94 (20). p. 203108. ISSN 00036951
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Official URL: http://dx.doi.org/10.1063/1.3141457
| Item Type: | Article |
|---|---|
| InterNano Taxonomy: | Nanomanufacturing Processes > Nanopatterning/Lithography > Advanced photolithography Nanomanufacturing Characterization Techniques > Diffraction and Scattering > Diffraction imaging |
| Collections: | Nanomanufacturing Research Collection |
| Related URLs: | |
| ID Code: | 153 |
| Deposited By: | Rebecca Reznik-Zellen |
| Deposited On: | 09 Nov 2009 10:10 |
| Last Modified: | 09 Nov 2009 10:10 |
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