A simple design of flat hyperlens for lithography and imaging with half-pitch resolution down to 20 nm

Xiong, Yi and Liu, Zhaowei and Zhang, Xiang. (2009) A simple design of flat hyperlens for lithography and imaging with half-pitch resolution down to 20 nm. Applied Physics Letters, 94 (20). p. 203108. ISSN 00036951

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Item Type:	Article
InterNano Taxonomy:	Nanomanufacturing Processes > Nanopatterning/Lithography > Advanced photolithography Nanomanufacturing Characterization Techniques > Diffraction and Scattering > Diffraction imaging
Collections:	Nanomanufacturing Research Collection
Related URLs:	http://www.internano.org/content/view/26...
Depositing User:	Rebecca Reznik-Zellen
Date Deposited:	09 Nov 2009 15:10
Last Modified:	09 Nov 2009 15:10
URI:	http://eprints.internano.org/id/eprint/153

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