Ryu, Koungmin and Badmaev, Alexander and Wang, Chuan and Lin, Albert and Patil, Nishant and Gomez, Lewis and Kumar, Akshay and Mitra, Subhasish and Wong, H.-S. Philip and Zhou, Chongwu. (2009) CMOS-Analogous Wafer-Scale Nanotube-on-Insulator Approach for Submicrometer Devices and Integrated Circuits Using Aligned Nanotubes. Nano Letters, 9 (1). pp. 189-197. ISSN 1530-6984
Full text not available from this repository. (Request a copy)Abstract
Massive aligned carbon nanotubes hold great potential but also face significant integration/assembly challenges for future beyond-silicon nanoelectronics. We report a wafer-scale processing of aligned nanotube devices and integrated circuits, including progress on essential technological components such as wafer-scale synthesis of aligned nanotubes, wafer-scale transfer of nanotubes to silicon wafers, metallic nanotube removal and chemical doping, and defect-tolerant integrated nanotube circuits. We have achieved synthesis of massive aligned nanotubes on complete 4 in. quartz and sapphire substrates, which were then transferred to 4 in. Si/SiO2 wafers. CMOS analogous fabrication was performed to yield transistors and circuits with features down to 0.5 μm, with high current density 20 μA/μm and good on/off ratios. In addition, chemical doping has been used to build fully integrated complementary inverter with a gain ~5, and a defect-tolerant design has been employed for NAND and NOR gates. This full-wafer approach could serve as a critical foundation for future integrated nanotube circuits.
Item Type: | Article |
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Additional Information: | Abstract reprinted with permission from the American Chemical Society. |
InterNano Taxonomy: | Nanoscale Objects and Nanostructured Materials > Nanodevice Structures > Nanoelectronic circuits and architectures Nanoscale Objects and Nanostructured Materials > Nanotubes > Carbon nanotubes |
Collections: | Nanomanufacturing Research Collection |
Related URLs: | |
Depositing User: | Rebecca Reznik-Zellen |
Date Deposited: | 06 Nov 2009 18:50 |
Last Modified: | 06 Nov 2009 18:50 |
URI: | http://eprints.internano.org/id/eprint/164 |
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