Hendricks, N. R. and Watkins, J. J. and Carter, K. R.. (2011) Formation of hierarchical silica nanochannels through nanoimprint lithography. Journal of Materials Chemistry, 21 (37). pp. 14213-14218.
Full text not available from this repository.Abstract
Hierarchically structured silica nanochannels were fabricated through the combination of supercritical carbon dioxide mediated silica deposition and nanoimprint lithography of a sacrificial polymer template. Highly-ordered mesoporous silica was prepared with either spherical or cylindrical domain level features, similar to 5-6 nm in diameter, to compliment the device level structure of the embedded nanochannels. The hierarchical structure was used as a test device for low-k dielectric materials with a dielectric constant of 2.0 observed.
| Item Type: | Article |
|---|---|
| InterNano Taxonomy: | Nanomanufacturing Processes > Nanopatterning/Lithography |
| Collections: | Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for Hierarchical Manufacturing |
| Depositing User: | Robert Stevens |
| Date Deposited: | 03 May 2012 16:19 |
| Last Modified: | 03 May 2012 16:19 |
| URI: | http://eprints.internano.org/id/eprint/1752 |
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