Formation of hierarchical silica nanochannels through nanoimprint lithography

Hendricks, N. R. and Watkins, J. J. and Carter, K. R.. (2011) Formation of hierarchical silica nanochannels through nanoimprint lithography. Journal of Materials Chemistry, 21 (37). pp. 14213-14218.

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Hierarchically structured silica nanochannels were fabricated through the combination of supercritical carbon dioxide mediated silica deposition and nanoimprint lithography of a sacrificial polymer template. Highly-ordered mesoporous silica was prepared with either spherical or cylindrical domain level features, similar to 5-6 nm in diameter, to compliment the device level structure of the embedded nanochannels. The hierarchical structure was used as a test device for low-k dielectric materials with a dielectric constant of 2.0 observed.

Item Type: Article
InterNano Taxonomy: Nanomanufacturing Processes > Nanopatterning/Lithography
Collections: Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for Hierarchical Manufacturing
Depositing User: Robert Stevens
Date Deposited: 03 May 2012 16:19
Last Modified: 03 May 2012 16:19

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