Hendricks, N. R. and Watkins, J. J. and Carter, K. R.. (2011) Formation of hierarchical silica nanochannels through nanoimprint lithography. Journal of Materials Chemistry, 21 (37). pp. 14213-14218.Full text not available from this repository.
Hierarchically structured silica nanochannels were fabricated through the combination of supercritical carbon dioxide mediated silica deposition and nanoimprint lithography of a sacrificial polymer template. Highly-ordered mesoporous silica was prepared with either spherical or cylindrical domain level features, similar to 5-6 nm in diameter, to compliment the device level structure of the embedded nanochannels. The hierarchical structure was used as a test device for low-k dielectric materials with a dielectric constant of 2.0 observed.
|InterNano Taxonomy:||Nanomanufacturing Processes > Nanopatterning/Lithography|
|Collections:||Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for Hierarchical Manufacturing|
|Depositing User:||Robert Stevens|
|Date Deposited:||03 May 2012 16:19|
|Last Modified:||03 May 2012 16:19|
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