Vijayakumar, P. and Narayanan, P. and Koren, I. and Mani Krishna, C. and Moritz, C. A..
(2011)
Impact of nanomanufacturing flow on systematic yield losses in nanoscale fabrics.
In: Nanoscale Architectures (NANOARCH), 2011 IEEE/ACM International Symposium on.
Full text not available from this repository.
| Item Type: |
Conference or Workshop Item
(UNSPECIFIED)
|
| Uncontrolled Keywords: |
bottom up fabrication, constant defect rates, fabrics, lithographic masks, mask overlay, masks, nanoelectronic circuits, nanoelectronics, nanofabrication, nanomanufacturing flow, nanoscale fabrics, nanowires, reliability, reliable manufacturing, scalable manufacturing, self assembly, systematic yield losses |
| Collections: |
Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for Hierarchical Manufacturing |
| Depositing User: |
Robert Stevens
|
| Last Modified: |
19 Apr 2012 20:07 |
| URI: |
http://eprints.internano.org/id/eprint/1763 |
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