Direct patterning of quantum dot nanostructures via electron beam lithography

Nandwana, Vikas and Subramani, Chandramouleeswaran and Yeh, Yi-Cheun and Yang, Boqian and Dickert, Stefan and Barnes, Michael D. and Tuominen, Mark T. and Rotello, Vincent M.. (2011) Direct patterning of quantum dot nanostructures via electron beam lithography. Journal of Materials Chemistry, 21 (42). pp. 16859-16862. ISSN 0959-9428

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Abstract

Patterned quantum dot (QD) nanostructures were prepared by direct electron beam lithography on QD films. Time resolved photoluminescence measurements show that the optical properties of these QDs were retained after cross-linking.

Item Type: Article
InterNano Taxonomy: Nanomanufacturing Processes > Nanopatterning/Lithography > Electron-beam lithography
Nanoscale Objects and Nanostructured Materials > Nanoparticles > Quantum confinement
Collections: Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for Hierarchical Manufacturing
Depositing User: Robert Stevens
Date Deposited: 19 Apr 2012 21:03
Last Modified: 19 Apr 2012 21:03
URI: http://eprints.internano.org/id/eprint/1815

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