Nandwana, Vikas and Subramani, Chandramouleeswaran and Yeh, Yi-Cheun and Yang, Boqian and Dickert, Stefan and Barnes, Michael D. and Tuominen, Mark T. and Rotello, Vincent M.. (2011) Direct patterning of quantum dot nanostructures via electron beam lithography. Journal of Materials Chemistry, 21 (42). pp. 16859-16862. ISSN 0959-9428Full text not available from this repository.
Patterned quantum dot (QD) nanostructures were prepared by direct electron beam lithography on QD films. Time resolved photoluminescence measurements show that the optical properties of these QDs were retained after cross-linking.
|InterNano Taxonomy:||Nanomanufacturing Processes > Nanopatterning/Lithography > Electron-beam lithography
Nanoscale Objects and Nanostructured Materials > Nanoparticles > Quantum confinement
|Collections:||Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for Hierarchical Manufacturing|
|Depositing User:||Robert Stevens|
|Date Deposited:||19 Apr 2012 21:03|
|Last Modified:||19 Apr 2012 21:03|
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