Zheng, P. W. and McCarthy, T. J.. (2011) D(4)(H)/D(4)(V) Silicone: A Replica Material with Several Advantages for Nanoimprint Lithography and Capillary Force Lithography. Langmuir, 27 (13). pp. 7976-7979.Full text not available from this repository.
Reported are demonstrations that D(4)(H)/D(4)(V) silicone (the product of the platinum-catalyzed hydrosilylation reaction between tetramethylcyclotetrasiloxane and tetramethyltetravinylcyclotetrasiloxane) is useful and practical as a replica material for both nanoimprint lithography (NIL) and capillary force lithography (CFL). The multiple advantageous properties of this extremely cross-linked material include UV transparency (for photo NIL and photo CFL), thermal stability (for high printing temperatures), high modulus (for high printing pressures), low surface energy (for easy demolding), and low viscosity precursors (for replicating small scale features). The replication performance of this material was tested using Blu-ray discs with sub-25 nm features and anodized aluminum foil with sub-10 nm features. Structures of similar to 5 nm length scale on the surface of the anodized Al were replicated using D(4)(H)/D(4)(V) silicone as a mold material for CFL with a photocurable epoxy resin and for NIL with poly(methyl methacrylate) (PMMA). Features (holes in the anodized aluminum) with aspect ratios of greater than 9 were replicated.
|InterNano Taxonomy:||Nanoscale Objects and Nanostructured Materials
|Collections:||Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for Hierarchical Manufacturing|
|Depositing User:||Robert Stevens|
|Date Deposited:||19 Apr 2012 20:13|
|Last Modified:||02 May 2012 18:15|
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