Shin, Y. J. ;. and Wu, Y. K. ;. and Guo, L. J.. (2013) Nanoimprinting Ultra Small and High Aspect Ratio Structures by using Rubber-toughened UV Cure Epoxy Resist. Nanotechnology.
Full text not available from this repository.| Item Type: | Article |
|---|---|
| Collections: | Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for Hierarchical Manufacturing |
| Depositing User: | Robert Stevens |
| Date Deposited: | 26 Mar 2014 |
| Last Modified: | 26 Mar 2014 19:43 |
| URI: | http://eprints.internano.org/id/eprint/2119 |
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