Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template

Sun, Z. W. and Chen, Z. B. and Zhang, W. X. and Choi, J. and Huang, C. L. and Jeong, G. J. and Coughlin, E. B. and Hsu, Y. T. and Yang, X. M. and Lee, K. Y. and Kuo, D. S. and Xiao, S. G. and Russell, T. P.. (2015) Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template. Advanced Materials, 27 (29). pp. 4364-4370.

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Item Type: Article
Additional Information: ISI Document Delivery No.: CO2WYTimes Cited: 0Cited Reference Count: 48Sun, Zhiwei Chen, Zhenbin Zhang, Wenxu Choi, Jaewon Huang, Caili Jeong, Gajin Coughlin, E. Bryan Hsu, Yautzong Yang, XiaoMin Lee, Kim Y. Kuo, David S. Xiao, Shuaigang Russell, Thomas P.Seagate Technologies; NSF-Supported Center for Hierarchical Manufacturing at the University of Massachusetts CMMI-1025020; Office of Science, Office of Basic Energy Sciences, of the US Department of Energy; US Army MURIon Ion Transport in Complex Heterogeneous Organic Materials W911NF-10-1-0520Z.S. and Z.C. contributed equally to this work. This work was supported by Seagate Technologies and the NSF-Supported Center for Hierarchical Manufacturing (CMMI-1025020) at the University of Massachusetts. The authors acknowledge the use of Beamline 7.3.3 at Advanced Light Source, Berkeley National Laboratory, which is supported by the Office of Science, Office of Basic Energy Sciences, of the US Department of Energy. E.B.C. and W.Z. were supported by the US Army MURIon Ion Transport in Complex Heterogeneous Organic Materials (W911NF-10-1-0520).0Wiley-v c h verlag gmbhWeinheim1521-4095
Uncontrolled Keywords: Physics
Collections: Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for Hierarchical Manufacturing
Depositing User: Robert Stevens
Date Deposited: 12 Nov 2015 18:38
Last Modified: 12 Nov 2015 18:38
URI: http://eprints.internano.org/id/eprint/2320

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