Srituravanich, Werayut and Fang, Nicholas and Sun, Cheng and Luo, Qi and Zhang, Xiang. (2004) Plasmonic Nanolithography. Nano Letters, 4 (6). pp. 1085-1088. ISSN 1530-6984
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Official URL: http://dx.doi.org/10.1021/nl049573q
Abstract
In this paper, we demonstrate high-density nanolithography by utilizing surface plasmons (SPs). SPs are excited on an aluminum substrate perforated with 2-D hole arrays using a near UV light source in order to resolve sub-wavelength features with high transmission. Our lithography experiments using a 365 nm wavelength light source demonstrate 90 nm dot array patterns on a 170 nm period, well beyond the diffraction limit of far-field optical lithography. In far-field transmission measurements, strong UV light transmission and the wavelength-dependent transmission are observed, which confirms the contribution of SPs. Furthermore, an exposure with larger spacing between the mask and photoresist has been explored for potential noncontact lithography.
| Item Type: | Article |
|---|---|
| Additional Information: | Reprinted with permission from "Plasmonic Nanolithography", Srituravanich W et al., Nano Letters, 2004, 4 (6), pp 1085–1088. Copyright 2004 American Chemical Society. |
| InterNano Taxonomy: | Nanoscale Objects and Nanostructured Materials > Nanocomposites > Thin films Nanomanufacturing Processes > Nanopatterning/Lithography > Plasmonic lithography |
| Collections: | Nanomanufacturing Research Collection |
| ID Code: | 333 |
| Deposited By: | Moureen Kemei |
| Deposited On: | 10 Mar 2010 14:42 |
| Last Modified: | 10 Mar 2010 14:42 |
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