Plasmonic Nanolithography

Srituravanich, Werayut and Fang, Nicholas and Sun, Cheng and Luo, Qi and Zhang, Xiang. (2004) Plasmonic Nanolithography. Nano Letters, 4 (6). pp. 1085-1088. ISSN 1530-6984

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Abstract

In this paper, we demonstrate high-density nanolithography by utilizing surface plasmons (SPs). SPs are excited on an aluminum substrate perforated with 2-D hole arrays using a near UV light source in order to resolve sub-wavelength features with high transmission. Our lithography experiments using a 365 nm wavelength light source demonstrate 90 nm dot array patterns on a 170 nm period, well beyond the diffraction limit of far-field optical lithography. In far-field transmission measurements, strong UV light transmission and the wavelength-dependent transmission are observed, which confirms the contribution of SPs. Furthermore, an exposure with larger spacing between the mask and photoresist has been explored for potential noncontact lithography.

Item Type: Article
Additional Information: Reprinted with permission from "Plasmonic Nanolithography", Srituravanich W et al., Nano Letters, 2004, 4 (6), pp 1085–1088. Copyright 2004 American Chemical Society.
InterNano Taxonomy: Nanoscale Objects and Nanostructured Materials > Nanocomposites > Thin films
Nanomanufacturing Processes > Nanopatterning/Lithography > Plasmonic lithography
Collections: Nanomanufacturing Research Collection
Depositing User: Moureen Kemei
Date Deposited: 10 Mar 2010 19:42
Last Modified: 10 Mar 2010 19:42
URI: http://eprints.internano.org/id/eprint/333

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