Far-Field Optical Superlens

Liu, Zhaowei and Durant, Stéphane and Lee, Hyesog and Pikus, Yuri and Fang, Nicolas and Xiong, Yi and Sun, Cheng and Zhang, Xiang. (2007) Far-Field Optical Superlens. Nano Letters, 7 (2). pp. 403-408. ISSN 1530-6984

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Far-field optical lens resolution is fundamentally limited by diffraction, which typically is about half of the wavelength. This is due to the evanescent waves carrying small scale information from an object that fades away in the far field. A recently proposed superlens theory offers a new approach by surface excitation at the negative index medium. We introduce a far-field optical superlens (FSL) that is capable of imaging beyond the diffraction limit. The FSL significantly enhances the evanescent waves of an object and converts them into propagating waves that are measured in the far field. We show that a FSL can image a subwavelength object consisting of two 50 nm wide lines separated by 70 nm working at 377 nm wavelength. The optical FSL promises new potential for nanoscale imaging and lithography.

Item Type: Article
Additional Information: Reprinted with permission from "Far-Field Optical Superlens", Liu ZW et al., Nano Lett., 2007, 7 (2), pp 403–408. Copyright 2007 American Chemical Society.
Uncontrolled Keywords: Lens, Optical Imaging
InterNano Taxonomy: Nanoscale Objects and Nanostructured Materials > Nanocomposites > Optical
Collections: Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for Scalable and Integrated Nanomanufacturing
Depositing User: Moureen Kemei
Date Deposited: 29 Mar 2010 22:19
Last Modified: 30 Sep 2014 14:52
URI: http://eprints.internano.org/id/eprint/382

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