Lee, H and Liu, Z and Xiong, Y and Sun, C and Zhang, X. (2008) Design, fabrication and characterization of a Far-field Superlens. Solid State Communications, 146 (5-6). pp. 202-207. ISSN 00381098
Full text not available from this repository. (Request a copy)Abstract
The fabrication process as well as the optical characterization of a Far-field Superlens (FSL) is presented in detail. A FSL is capable of optically imaging well below the diffraction limit and works by enhancing and scattering evanescent waves to the far field which is then used to numerically reconstruct the object image [S. Durant, J. Opt. Soc. Am. B. 23(2006) 2383; Z. Liu, S. Durant, H. Lee, Y. Pikus, N. Fang, Y. Xiong, C. Sun, X. Zhang, Nano Lett. 7 (2007) 403]. We demonstrate the resolution of 70 nm gap distance of a three-line object in the far field. Also, a full optical imaging scheme, without the need for numerical processing, for a direct real-time subdiffraction-limited imaging is presented. Such remarkable imaging capability of FSL will revolutionize the optical imaging technique in the field of bio-imaging and nanolithography.
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | Optical imaging |
| InterNano Taxonomy: | Nanoscale Objects and Nanostructured Materials > Nanocomposites > Thin films |
| Collections: | Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for Scalable and Integrated Nanomanufacturing |
| Depositing User: | Moureen Kemei |
| Date Deposited: | 05 Apr 2010 19:50 |
| Last Modified: | 26 Sep 2014 21:22 |
| URI: | http://eprints.internano.org/id/eprint/408 |
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