Flying plasmonic lens in the near field for high-speed nanolithography

Srituravanich, Werayut and Pan, Liang and Wang, Yuan and Sun, Cheng and Bogy, David B. and Zhang, Xiang. (2008) Flying plasmonic lens in the near field for high-speed nanolithography. Nature Nanotechnology, 3 (12). pp. 733-737. ISSN 1748-3387

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Abstract

The commercialization of nanoscale devices requires the development of high-throughput nanofabrication technologies that allow frequent design changes(1,2). Maskless nanolithography(3-13), including electron-beam and scanning-probe lithography, offers the desired flexibility but is limited by low throughput. Here, we report a new low-cost, high-throughput approach to maskless nanolithography that uses an array of plasmonic lenses that 'flies' above the surface to be patterned, concentrating short-wavelength surface plasmons into sub-100 nm spots. However, these nanoscale spots are only formed in the near field, which makes it very difficult to scan the array above the surface at high speed. To overcome this problem we have designed a self-spacing air bearing that can fly the array just 20 nm above a disk that is spinning at speeds of between 4 and 12 m s(-1), and have experimentally demonstrated patterning with a linewidth of 80 nm. This low-cost nanofabrication scheme has the potential to achieve throughputs that are two to five orders of magnitude higher than other maskless techniques.

Item Type: Article
Additional Information: Reprinted by permission from Macmillan Publishers Ltd: [Nature Nanotechnology] ("Flying plasmonic lens in the near field for high-speed nanolithography", Srituravanich W et al., Nature Nanotechnology 3, 733 - 737 (2008)), copyright (2008)
InterNano Taxonomy: Nanoscale Objects and Nanostructured Materials > Nanostructured Materials
Nanomanufacturing Processes > Nanopatterning/Lithography > Plasmonic lithography
Collections: Nanomanufacturing Research Collection
Depositing User: Moureen Kemei
Date Deposited: 12 Apr 2010 14:39
Last Modified: 12 Apr 2010 14:40
URI: http://eprints.internano.org/id/eprint/420

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