Thermal stability of thiol and silane monolayers: A comparative study

Chandekar, Amol and Sengupta, Sandip K. and Whitten, James E.. (2010) Thermal stability of thiol and silane monolayers: A comparative study. Applied Surface Science, 256 (9). pp. 2742-2749. ISSN 01694332

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The stability of self-assembled monolayers (SAMs) at elevated temperatures is of considerable technological importance. The thermal stability of 1-octadecanethiol (ODT), 16-mercaptohexadecanoic acid (MHDA) and 1H,1H,2H,2H-perfluorodecanethiol (PFDT) SAMs on gold surfaces, and of 4-aminobutyltriethoxysilane (ABTES) and 1H, 1H, 2H, 2H-perfluorodecyltriethoxysilane (PFDS) assembled on hydroxylated silicon surfaces, was studied by X-ray photoelectron spectroscopy (XPS). The samples were heated in ultrahigh vacuum to temperatures in excess of that required for SAM degradation. ODT monolayers were stable to ca. 110 °C, while MHDA and PFDT SAMs were stable to ca. 145 °C. ABTES SAMs were found to be indefinitely stable to 250 °C, while PFDS SAMs were stable to 350 °C. These studies demonstrate the advantages of using silane monolayers for moderate to high temperature applications and illustrate differences that arise due to the nature of the tail group. To demonstrate the feasibility of silanes for template-directed patterning, a hydroxylated silicon oxide surface containing microcontact-printed PFDS patterns was spin-coated with a mainly hydrophilic block copolymer. Annealing the surface at 90 °C for 2 h caused the block copolymer to dewet the hydrophobic PFDS-patterned regions and adsorb exclusively on the unpatterned regions of the surface.

Item Type: Article
InterNano Taxonomy: Nanomanufacturing Characterization Techniques > Thermal Analysis
Nanoscale Objects and Nanostructured Materials > Other Nanostructured Materials > Self assembled monolayers
Nanomanufacturing Processes > Nanopatterning/Lithography > Contact printing
Collections: Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for High-rate Nanomanufacturing
Depositing User: Moureen Kemei
Date Deposited: 03 May 2010 14:39
Last Modified: 29 Sep 2014 16:40

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