Measurement Challenges in Nanomanufacturing

Liddle, James A.. (2010) Measurement Challenges in Nanomanufacturing. In: New England Nanomanufacturing Summit 2010, June 22 - 24, 2010, Lowell, MA. (Unpublished)

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Abstract

Until recently, the semiconductor industry has been the only true nanomanufacturing industry. However, the increasing availability of significant quantities of nanoscale materials and of controllable nanostructuring techniques is enabling a range of new industrial scale nanomanufacturing processes. These are in contrast to both what is required for semiconductor manufacturing in three important ways: first the cost per unit area of typical products is or is projected to be very much lower than for integrated circuits; second, the degree of perfection required is in many cases significantly less; and third, the throughput is orders of magnitude higher. These three factors have an impact on the types of metrology required: it must be cheap, designed to do the minimum required, and fast. But these requirements run counter to those of the types of metrology needed for the fundamental understanding required to develop nanomanufacturing processes, which call for flexibility and precision and do not need to be fast or cheap. In this talk I will compare and contrast the types of measurement techniques that are needed to both understand the fundamental physics involved in nanofabrication as well as enable industrial scale nanomanufacturing processes.

Item Type: Conference or Workshop Item (Paper)
InterNano Taxonomy: Environment, Health, and Safety > Risk Assessment > Metrology
Nanomanufacturing Processes
Collections: National Nanomanufacturing Network Archive > Conferences and Workshops > New England Nanomanufacturing Summit 2010
Related URLs:
Depositing User: Robert Stevens
Date Deposited: 02 Jul 2010 12:23
Last Modified: 02 Jul 2010 12:23
URI: http://eprints.internano.org/id/eprint/513

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