Use of Self-Assembled Monolayers and Light to Tailor Adhesion on Surfaces for Nanomanufacturing Applications

Whitten, James E.. (2010) Use of Self-Assembled Monolayers and Light to Tailor Adhesion on Surfaces for Nanomanufacturing Applications. In: New England Nanomanufacturing Summit 2010, June 22 - 24, 2010, Lowell, MA. (Unpublished)

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Abstract

A key issue in nanomanufacturing is control of the adhesion properties of surfaces for transfer and patterning applications. Alkanethiol and silane monolayers adsorbed on gold and silicon oxide surfaces have been used to tailor the adhesion properties of surfaces for the subsequent deposition and patterning of oligomers, polymers and biomaterials, as demonstrated by atomic force microscope force-distance studies. It is shown that modified surfaces can be used to pattern materials with nanoscale resolution. UV light has also been used to alter the hydrophilicity of a TiO2(110) surface, and irradiation through a photomask makes possible the selective deposition of hydrophilic materials onto irradiated regions of the surface. The implications of this work for nanotechnology and nanomanufacturing will be discussed.

Item Type: Conference or Workshop Item (Paper)
Uncontrolled Keywords: adhesion properties, surface adhesion, self-assembled monolayers,
InterNano Taxonomy: Nanoscale Objects and Nanostructured Materials > Nanostructured Materials
Collections: National Nanomanufacturing Network Archive > Conferences and Workshops > New England Nanomanufacturing Summit 2010
Related URLs:
Depositing User: Rebecca Reznik-Zellen
Date Deposited: 02 Jul 2010 14:30
Last Modified: 02 Jul 2010 14:30
URI: http://eprints.internano.org/id/eprint/524

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