Auzelyte, Vaida and Dais, Christian and Farquet, Patrick and Grützmacher, Detlev and Heyderman, Laura J. and Luo, Feng and Olliges, Sven and Padeste, Celestino and Sahoo, Pratap K. and Thomson, Tom and Turchanin, Andrey and David, Christian and Solak, Harun H..
Extreme ultraviolet interference lithography at the Paul Scherrer Institut.
Journal of Micro/Nanolithography, MEMS and MOEMS, 8 (2).
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