Morse, Jeffrey. National Nanomanufacturing Network. (2010) Emerging Nanomanufacturing Techniques Included on Industry Roadmaps. NNN Newsletter, 3 (9).
NNN_newsletter_3-9_Sept10.html - Published Version
NNN_newsletter_3-9_Sept10.pdf - Published Version
Significant challenges exist for nanomanufacturing processes to gain acceptance within various industries, due in part to a mature infrastructure and supply chain, as well as potentially high capital expenses for technologies that might supplant existing tools and processes. While these issues are present in most sectors, the semiconductor industry is an prime example of an area where critical need must be demonstrated to justify the costs of replacing a substantial existing infrastructure. For example, optical lithographic tools enable patterning techniques that will only carry the industry for a few more years, after which no proven optical solutions exist to maintain progress within the constraints of the present roadmap. As a result, the International Technology Roadmap for Semiconductors (ITRS, 2009) includes both nanoimprint and directed self-assembly (DSA) patterning as part of the future roadmap for patterning solutions. Also: Aligned Carbon Nanotube Patterning Via Dry Contact Transfer Printing; NCMS Releases Findings from 3rd Study of Nanotechnology in the U.S. Manufacturing Industry; and NanoBusiness Alliance Interview with Larry Bock.
|Uncontrolled Keywords:||Roadmaps, National Center for Nanomanufacturing Sciences NCMS survey, technology transfer, CNT networks, dry contact transfer printing,|
|InterNano Taxonomy:||Areas of Application > Electronics and Semiconductor Industries
Nanomanufacturing Processes > Nanopatterning/Lithography > Contact printing
Nanoscale Objects and Nanostructured Materials > Nanotubes > Carbon nanotubes
|Collections:||National Nanomanufacturing Network Archive > NNN Newsletters|
|Depositing User:||Rebecca Reznik-Zellen|
|Date Deposited:||10 Mar 2011 17:01|
|Last Modified:||10 Mar 2011 17:01|
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