Ofir, Yuval and Moran, Isaac W. and Subramani, Chandramouleeswaran and Carter, Kenneth R. and Rotello, Vincent M.. (2010) Nanoimprint Lithography for Functional Three-Dimensional Patterns. Advanced Materials, 22 (32). p. 3608. ISSN 09359648
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Official URL: http://dx.doi.org/10.1002/adma.200904396
| Item Type: | Article |
|---|---|
| InterNano Taxonomy: | Nanomanufacturing Processes |
| Collections: | Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for Hierarchical Manufacturing |
| Depositing User: | Amulya Gullapalli |
| Date Deposited: | 15 Jul 2011 18:43 |
| Last Modified: | 15 Jul 2011 18:43 |
| URI: | http://eprints.internano.org/id/eprint/935 |
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