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Srituravanich, W. and Fang, N. and Durant, S. and Ambati, M. and Sun, C. and Zhang, X.. (2004) Sub-100 nm lithography using ultrashort wavelength of surface plasmons. In: 48th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, June 01-04, 2004, Carlifonia.
