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LaFontaine, B. M. and Naulleau, P. P. and Daga, V. K. and Lin, Y. and Watkins, J. J. and Okoroanyanwu, U. and Petrillo, K. and Ashworth, D. and Peng, H. G. and Soles, C. L.. (2011) Additive-loaded EUV photoresists: performance enhancement and the underlying physics. In: Extreme Ultraviolet. Proceedings of SPIE, 7969 . SPIE.
