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Hagberg, Erik C. and Hart, Mark W. and Cong, Lianhui and Allen, Christopher W. and Carter, Kenneth R.. (2007) Cyclophosphazene-containing Polymers as Imprint Lithography Resists. Journal of Inorganic and Organometallic Polymers and Materials, 17 (2). pp. 377-385. ISSN 1574-1443

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