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Stoykovich, Mark P. and Kang, Huiman and Daoulas, Kostas Ch. and Liu, Guoliang and Liu, Chi-Chun and de Pablo, Juan J. and Müller, Marcus and Nealey, Paul F.. (2007) Directed Self-Assembly of Block Copolymers for Nanolithography: Fabrication of Isolated Features and Essential Integrated Circuit Geometries. ACS Nano, 1 (3). p. 168. ISSN 1936-0851

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