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SELVARASAH, S and CHAO, S and CHEN, C and SRIDHAR, S and BUSNAINA, A and KHADEMHOSSEINI, A and DOKMECI, M. (2008) A reusable high aspect ratio parylene-C shadow mask technology for diverse micropatterning applications. Sensors and Actuators A: Physical, 145-146. p. 306. ISSN 09244247

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