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Backer, Scott A. and Suez, Itai and Fresco, Zachary M. and FreĢchet, Jean M. J. and Conway, Josh A. and Vedantam, Shantha and Lee, Hyojune and Yablonovitch, Eli. (2007) Evaluation of new materials for plasmonic imaging lithography at 476 nm using near field scanning optical microscopy. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 25 (4). pp. 1336-1339. ISSN 10711023

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