Ahn, Yong Sik and Chen, Y and Hahn, HT. (2009) A resist for electric imprint lithography. Microelectronic Engineering, 86 (3). p. 392. ISSN 01679317
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Official URL: http://dx.doi.org/10.1016/j.mee.2008.11.085
Abstract
An electrically curable resist has been developed that can make electric imprint lithography (EIL) a reality. The resist is composed of a diaryliodonium salt photo acid generator and a cycloaliphatic epoxy monomer. Its polymerization takes place when an electric potential is applied between a conductive imprint mold and a substrate which sandwich the resist. A proof-of-concept pattern transfer by EIL with a micron-scale resolution has been demonstrated. Published by Elsevier B.V.
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | NANOIMPRINT LITHOGRAPHY; RESIDUAL LAYERS; UV-NANOIMPRINT; STEP |
| InterNano Taxonomy: | Nanoscale Objects and Nanostructured Materials Nanoscale Objects and Nanostructured Materials > Nanocomposites > Thin films Nanomanufacturing Processes Nanomanufacturing Processes > Nanopatterning/Lithography |
| Collections: | Nanomanufacturing Research Collection |
| ID Code: | 110 |
| Deposited By: | Danielle Federa |
| Deposited On: | 15 Jun 2009 15:07 |
| Last Modified: | 19 Sep 2011 17:08 |
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