A resist for electric imprint lithography

Ahn, Yong Sik and Chen, Y and Hahn, HT. (2009) A resist for electric imprint lithography. Microelectronic Engineering, 86 (3). p. 392. ISSN 01679317

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Abstract

An electrically curable resist has been developed that can make electric imprint lithography (EIL) a reality. The resist is composed of a diaryliodonium salt photo acid generator and a cycloaliphatic epoxy monomer. Its polymerization takes place when an electric potential is applied between a conductive imprint mold and a substrate which sandwich the resist. A proof-of-concept pattern transfer by EIL with a micron-scale resolution has been demonstrated. Published by Elsevier B.V.

Item Type: Article
Uncontrolled Keywords: NANOIMPRINT LITHOGRAPHY; RESIDUAL LAYERS; UV-NANOIMPRINT; STEP
InterNano Taxonomy: Nanoscale Objects and Nanostructured Materials
Nanoscale Objects and Nanostructured Materials > Nanocomposites > Thin films
Nanomanufacturing Processes
Nanomanufacturing Processes > Nanopatterning/Lithography
Collections: Nanomanufacturing Research Collection
Depositing User: Danielle Federa
Date Deposited: 15 Jun 2009 19:07
Last Modified: 19 Sep 2011 21:08
URI: http://eprints.internano.org/id/eprint/110

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