Browse by InterNano Taxonomy

Up a level
Export as [feed] Atom [feed] RSS 1.0 [feed] RSS 2.0
Group by: Creators | Item Type
Jump to: A | B | C | F | G | H | I | J | K | L | M | N | P | R | S | T | W | X | Z
Number of items at this level: 70.

A

Ahn, Se Hyun and Guo, L. Jay. (2009) Large-Area Roll-to-Roll and Roll-to-Plate Nanoimprint Lithography: A Step toward High-Throughput Application of Continuous Nanoimprinting. ACS Nano, 3 (8). p. 2304. ISSN 1936-0851

Acikgoz, Canet and Hempenius, Mark A and Julius Vancso, G and Huskens, Jurriaan. (2009) Direct Surface Structuring of Organometallic Resists Using Nanoimprint Lithography. Nanotechnology, 20 (13). pp. 135304-135311. ISSN 0957-4484

Ahn, Yong Sik and Chen, Y and Hahn, HT. (2009) A resist for electric imprint lithography. Microelectronic Engineering, 86 (3). p. 392. ISSN 01679317

B

Backer, Scott A. and Suez, Itai and Fresco, Zachary M. and Fréchet, Jean M. J. and Conway, Josh A. and Vedantam, Shantha and Lee, Hyojune and Yablonovitch, Eli. (2007) Evaluation of new materials for plasmonic imaging lithography at 476 nm using near field scanning optical microscopy. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 25 (4). pp. 1336-1339. ISSN 10711023

Backer, Scott A. and Suez, Itai and Fresco, Zachary M. and Rolandi, Marco and Fréchet, Jean M. J.. (2007) Covalent Formation of Nanoscale Fullerene and Dendrimer Patterns. Langmuir, 23 (5). pp. 2297-2299. ISSN 0743-7463

C

Cho, Si-Hyeong and Busnaina, Ahmed A. and Park, Jin-Goo. (2010) Large Area CoNi Stress Free Electroformed Mold for Nanoimprint Lithography. In: New England Nanomanufacturing Summit 2010, June 22 - 24, 2010, Lowell, MA. (Unpublished)

Christman, Karen L. and Schopf, Eric and Broyer, Rebecca M. and Li, Ronald C. and Chen, Yong and Maynard, Heather D.. (2009) Positioning Multiple Proteins at the Nanoscale with Electron Beam Cross-Linked Functional Polymers. Journal of the American Chemical Society, 131 (2). pp. 521-527. ISSN 0002-7863

Chang, Yu and Huang, Suxian and Chen, Yong. (2009) Biomolecular Nanopatterning by Electrophoretic Printing Lithography. Small, 5 (1). pp. 63-66. ISSN 16136810

Chen, Hung-Ting and Crosby, Todd A. and Park, Myoung-Hwan and Nagarajan, Sivakumar and Rotello, Vincent M. and Watkins, James J.. (2009) Accessibility of cylindrical channels within patterned mesoporous silica films using nanoparticle diffusion. Journal of Materials Chemistry, 19 (1). pp. 70-74. ISSN 0959-9428

Chang, Yu and Ahn, Yong Sik and Hahn, H. Thomas and Chen, Yong. (2007) Sub-micrometer Patterning of Proteins by Electric Lithography. Langmuir, 23 (8). pp. 4112-4114. ISSN 0743-7463

Christman, Karen L. and Enriquez-Rios, Vanessa D. and Maynard, Heather D.. (2006) Nanopatterning proteins and peptides. Soft Matter, 2 (11). pp. 928-939. ISSN 1744-683X

Christman, Karen L. and Requa, Michael V. and Enriquez-Rios, Vanessa D. and Ward, Sabrina C. and Bradley, Kenneth A. and Turner, Kimberly L. and Maynard, Heather D.. (2006) Submicron Streptavidin Patterns for Protein Assembly. Langmuir, 22 (17). pp. 7444-7450. ISSN 0743-7463

Chimmalgi, A. and Grigoropoulos, C. P. and Komvopoulos, K.. (2005) Surface nanostructuring by nano-/femtosecond laser-assisted scanning force microscopy. Journal of Applied Physics, 97 (10). p. 104319. ISSN 00218979

F

Feng, Xue and Meitl, Matthew A. and Bowen, Audrey M. and Huang, Yonggang and Nuzzo, Ralph G. and Rogers, John A.. (2007) Competing Fracture in Kinetically Controlled Transfer Printing. Langmuir, 23 (25). p. 12555. ISSN 0743-7463

Fresco, Zachary M. and Suez, Itai and Backer, Scott A. and Fréchet, Jean M. J.. (2004) AFM-Induced Amine Deprotection: Triggering Localized Bond Cleavage by Application of Tip/Substrate Voltage Bias for the Surface Self-Assembly of Nanosized Dendritic Objects. Journal of the American Chemical Society, 126 (27). pp. 8374-8375. ISSN 0002-7863

G

Gu, Zhen and Huang, Suxian and Chen, Yong. (2008) Biomolecular Nanopatterning by Magnetic Electric Lithography. Angewandte Chemie International Edition, 48 (5). pp. 952-955. ISSN 14337851

Germain, Jonathan and Rolandi, Marco and Backer, Scott A. and Fréchet, Jean M. J.. (2008) Sulfur as a Novel Nanopatterning Material: An Ultrathin Resist and a Chemically Addressable Template for Nanocrystal Self-Assembly. Advanced Materials, 20 (23). pp. 4526-4529. ISSN 09359648

Ge, Haixiong and Shen, Wenjiang and Chen, Yong. (2008) Electrically curable double-layer polymer resist for dynamic nanoscale lithography. Soft Matter, 4 (6). pp. 1178-1182. ISSN 1744-683X

Grigoropoulos, Costas P. and Hwang, David J. and Chimmalgi, A.. (2007) Nanometer-Scale Laser Direct-Write Using Near-Field Optics. MRS bulletin, 32 (1). pp. 16-22. ISSN 0883-7694

H

Hendricks, N. R. and Watkins, J. J. and Carter, K. R.. (2011) Formation of hierarchical silica nanochannels through nanoimprint lithography. Journal of Materials Chemistry, 21 (37). pp. 14213-14218.

He, Ximin and Gao, Feng and Tu, Guoli and Hasko, David and Hüttner, Sven and Steiner, Ullrich and Greenham, Neil C. and Friend, Richard H. and Huck, Wilhelm T. S.. (2010) Formation of Nanopatterned Polymer Blends in Photovoltaic Devices. Nano Letters, 10 (4). pp. 1302-1307. ISSN 1530-6984

Hagberg, Erik C. and Scott, J. Campbell and Shaw, Justine A. and von Werne, Timothy A. and Maegerlein, Janet A. and Carter, Kenneth R.. (2007) Mold and Metallization: Nanocontact Molding for the Fabrication of Metal Structures. Small, 3 (10). pp. 1703-1706. ISSN 16136810

Hagberg, Erik C. and Hart, Mark W. and Cong, Lianhui and Allen, Christopher W. and Carter, Kenneth R.. (2007) Cyclophosphazene-containing Polymers as Imprint Lithography Resists. Journal of Inorganic and Organometallic Polymers and Materials, 17 (2). pp. 377-385. ISSN 1574-1443

HUANG, A and WONG, V and HO, C. (2006) Silicone polymer chemical vapor sensors fabricated by direct polymer patterning on substrate technique (DPPOST). Sensors and Actuators B: Chemical, 116 (1-2). pp. 2-10. ISSN 09254005

Hsia, K. J. and Huang, Y. and Menard, E. and Park, J.-U. and Zhou, W. and Rogers, J. and Fulton, J. M.. (2005) Collapse of stamps for soft lithography due to interfacial adhesion. Applied Physics Letters, 86 (15). p. 154106. ISSN 00036951

Huang, Yonggang Y. and Zhou, Weixing and Hsia, K. J. and Menard, Etienne and Park, Jang-Ung and Rogers, John A. and Alleyne, Andrew G.. (2005) Stamp Collapse in Soft Lithography. Langmuir, 21 (17). p. 8058. ISSN 0743-7463

I

Im, Jiwoon and Lee, Il-Ha and Lee, Byung Yang and Kim, Byeongju and Park, June and Yu, Woojong and Kim, Un Jeong and Lee, Young Hee and Seong, Maeng-Je and Lee, Eun Hong and Min, Yo-Sep and Hong, Seunghun. (2009) Direct Printing of Aligned Carbon Nanotube Patterns for High-Performance Thin Film Devices. Applied Physics Letters, 94 (5). 053109. ISSN 00036951

J

Jan, Schroers. (2010) Nanoimprinting with Amorphous Metals. In: IGERT Seminar Series, 2009 - 2010, Amherst, MA. (Unpublished)

Jamshidi, Arash and Neale, Steven L. and Yu, Kyoungsik and Pauzauskie, Peter J. and Schuck, Peter James and Valley, Justin K. and Hsu, Hsan-Yin and Ohta, Aaron T. and Wu, Ming C.. (2009) NanoPen: Dynamic, Low-Power, and Light-Actuated Patterning of Nanoparticles. Nano Letters, 9 (8). pp. 2921-2925. ISSN 1530-6984

Jiwpanich, Siriporn and Sandanaraj, BS and Thayumanavan, S. (2009) Fluorophore-cored dendrimers for patterns in metalloprotein sensing. Chemical Communications (7). p. 806. ISSN 13597345

Jhaveri, Sarav B. and Beinhoff, Matthias and Hawker, Craig J. and Carter, Kenneth R. and Sogah, Dotsevi Y.. (2008) Chain-End Functionalized Nanopatterned Polymer Brushes Grown via in Situ Nitroxide Free Radical Exchange. ACS Nano, 2 (4). pp. 719-727. ISSN 1936-0851

K

Kwak, M.; and Ok, J.; and Guo, L. Jay. (2012) Continuous Lithography by Roller Mask and Application to Transparent Conductor Fabrication. In: SPIE Advanced Lithography.

Krumpfer, J. W. and Bian, P. and Zheng, P. W. and Gao, L. C. and McCarthy, T. J.. (2011) Contact Angle Hysteresis on Superhydrophobic Surfaces: An Ionic Liquid Probe Fluid Offers Mechanistic Insight. Langmuir, 27 (6). pp. 2166-2169. ISSN 0743-7463

Kim, Myungwoong and Safron, Nathaniel S. and Han, Eungnak and Arnold, Michael S. and Gopalan, Padma. (2010) Fabrication and Characterization of Large-Area, Semiconducting Nanoperforated Graphene Materials. Nano Letters, 10 (4). pp. 1125-1131. ISSN 1530-6984

Kershner, Ryan J. and Bozano, Luisa D. and Micheel, Christine M. and Hung, Albert M. and Fornof, Ann R. and Cha, Jennifer N. and Rettner, Charles T. and Bersani, Marco and Frommer, Jane and Rothemund, Paul W. K. and Wallraff, Gregory M.. (2009) Placement and orientation of individual DNA shapes on lithographically patterned surfaces. Nature Nanotechnology, 4 (9). pp. 557-561. ISSN 1748-3387

Karnik, Rohit and Castelino, Kenneth and Duan, Chuanhua and Majumdar, Arun. (2006) Diffusion-Limited Patterning of Molecules in Nanofluidic Channels. Nano Letters, 6 (8). pp. 1735-1740. ISSN 1530-6984

KANNAN, B and CASTELINO, K and CHEN, F and MAJUMDAR, A. (2006) Lithographic techniques and surface chemistries for the fabrication of PEG-passivated protein microarrays. Biosensors and Bioelectronics, 21 (10). pp. 1960-1967. ISSN 09565663

Kannan, Balaji and Kulkarni, Rajan P. and Satyanarayana, Srinath and Castelino, Kenneth and Majumdar, Arun. (2005) Chemical patterning for the highly specific and programmed assembly of nanostructures. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 23 (4). pp. 1364-1370. ISSN 0734211X

Kannan, Balaji and Kulkarni, Rajan P. and Majumdar, Arun. (2004) DNA-Based Programmed Assembly of Gold Nanoparticles on Lithographic Patterns with Extraordinary Specificity. Nano Letters, 4 (8). pp. 1521-1524. ISSN 1530-6984

L

LaFontaine, B. M. and Naulleau, P. P. and Daga, V. K. and Lin, Y. and Watkins, J. J. and Okoroanyanwu, U. and Petrillo, K. and Ashworth, D. and Peng, H. G. and Soles, C. L.. (2011) Additive-loaded EUV photoresists: performance enhancement and the underlying physics. In: Extreme Ultraviolet. Proceedings of SPIE, 7969 . SPIE.

Lee, JaeJong and Lee, SangRok. (2010) Nanoimprint Technology for Large Area Patterning and Its Applications. In: New England Nanomanufacturing Summit 2010, June 22 - 24, 2010, Lowell, MA. (Unpublished)

Lee, Jae Hyun and Kim, Dae Woo and Jang, Hong and Choi, Jong Kil and Geng, Jianxin and Jung, Jae Wook and Yoon, Sung Cheol and Jung, Hee-Tae. (2009) Enhanced Solar-Cell Efficiency in Bulk-Heterojunction Polymer Systems Obtained by Nanoimprinting with Commercially Available AAO Membrane Filters. Small, 5 (19). pp. 2139-2143. ISSN 16136810

Liu, Jun-Fu and Miller, GP. (2009) Field-assisted nanopatterning of metals, metal oxides and metal salts. Nanotechnology, 20 (5). 055303. ISSN 09574484

Li, Nan and Ho, CM. (2008) Photolithographic patterning of organosilane monolayer for generating large area two-dimensional B lymphocyte arrays. Lab on a Chip, 8 (12). p. 2105. ISSN 14730197

Lee, Minhwan and O’Hayre, Ryan and Prinz, Fritz B. and Gür, Turgut M.. (2004) Electrochemical nanopatterning of Ag on solid-state ionic conductor RbAg[sub 4]I[sub 5] using atomic force microscopy. Applied Physics Letters, 85 (16). pp. 3552-3554. ISSN 00036951

M

Morse, Jeffrey. National Nanomanufacturing Network. (2012) Case Studies in Nanomanufacturing Commercialization Through Effective Partnerships and Technology Transfer: Rolith Corporation. NNN Newsletter, 5 (12). (Unpublished)

Morse, Jeffrey. National Nanomanufacturing Network. (2010) Manufacturing Challenges and Innovations: NNN Testimony on Capitol Hill. NNN Newsletter, 3 (3).

Morse, Jeffrey. National Nanomanufacturing Network. (2010) Commercialization of Emergent Nanomanufacturing Platforms: Establishing Synergies and Roadmaps. NNN Newsletter, 3 (2).

Morse, Jeffrey. National Nanomanufacturing Network. (2009) NNN Test Bed Reviews: July 2009. NNN Newsletter, 2 (6).

Morse, Jeffrey. National Nanomanufacturing Network. (2008) The NNN Newsletter. NNN Newlsetter, 1 (1).

Moran, Isaac W. and Cheng, Dalton F. and Jhaveri, Sarav B. and Carter, Kenneth R.. (2008) High-resolution soft lithography of thin film resists enabling nanoscopic pattern transfer. Soft Matter, 4 (1). pp. 168-176. ISSN 1744-683X

Meitl, Matthew A. and Zhu, Zheng-Tao and Kumar, Vipan and Lee, Keon Jae and Feng, Xue and Huang, Yonggang Y. and Adesida, Ilesanmi and Nuzzo, Ralph G. and Rogers, John A.. (2006) Transfer printing by kinetic control of adhesion to an elastomeric stamp. Nature Materials, 5 (1). p. 33. ISSN 1476-1122

N

Nagarajan, Sivakumar and Bosworth, Joan K. and Ober, Christopher K. and Russell, Thomas P. and Watkins, James J.. (2008) Simple Fabrication of Micropatterned Mesoporous Silica Films Using Photoacid Generators in Block Copolymers†. Chemistry of Materials, 20 (3). pp. 604-606. ISSN 0897-4756

P

Park, J. Y. and Hendricks, N. R. and Carter, K. R.. (2011) Solvent-Assisted Soft Nanoimprint Lithography for Structured Bilayer Heterojunction Organic Solar Cells. Langmuir, 27 (17). pp. 11251-11258. ISSN 0743-7463

Pina-Hernandez, Carlos and Guo, L. Jay and Fu, Peng-Fei. (2010) High-Resolution Functional Epoxysilsesquioxane-Based Patterning Layers for Large-Area Nanoimprinting. ACS Nano, 4 (8). p. 4776. ISSN 1936-0851

Park, Soojin and Yavuzcetin, Ozgur and Kim, Bokyung and Tuominen, Mark T. and Russell, Thomas P.. (2009) A Simple Top-Down/Bottom-Up Approach to Sectored, Ordered Arrays of Nanoscopic Elements Using Block Copolymers. Small, 5 (9). pp. 1064-1069. ISSN 16136810

Park, Soojin and Wang, Jia-Yu and Kim, Bokyung and Russell, Thomas P.. (2008) From Nanorings to Nanodots by Patterning with Block Copolymers. Nano Letters, 8 (6). pp. 1667-1672. ISSN 1530-6984

R

Rolandi, Marco and Suez, Itai and Scholl, Andreas and Fréchet, Jean M. J.. (2007) Fluorocarbon Resist for High-Speed Scanning Probe Lithography. Angewandte Chemie International Edition, 46 (39). pp. 7477-7480. ISSN 14337851

S

Smith, Henry I. and Walsh, Michael E. and Zhang, Feng and Ferrera, J. and Menon, Rajesh. (2010) High-Speed Maskless Photolithography for Customized Nanomanufacturing. In: New England Nanomanufacturing Summit 2010, June 22 - 24, 2010, Lowell, MA. (Unpublished)

Shepherd, Robert F. and Panda, Priyadarshi and Bao, Zhihao and Sandhage, Kenneth H. and Hatton, T. Alan and Lewis, Jennifer A. and Doyle, Patrick S.. (2008) Stop-Flow Lithography of Colloidal, Glass, and Silicon Microcomponents. Advanced Materials, 20 (24). p. 4734. ISSN 09359648

Suez, I. and Rolandi, M. and Backer, S. A. and Scholl, A. and Doran, A. and Okawa, D. and Zettl, A. and Fréchet, J. M. J.. (2007) High-Field Scanning Probe Lithography in Hexadecane: Transitioning from Field Induced Oxidation to Solvent Decomposition through Surface Modification. Advanced Materials, 19 (21). pp. 3570-3573. ISSN 09359648

Stuart, Colin and Xu, Qianfei and Tseng, Ricky J. and Yang, Yang and Hahn, H. Thomas and Chen, Yong and Wu, Wei and Williams, R. Stanley. (2006) Nanofabrication module integrated with optical aligner. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 24 (2). pp. 539-542. ISSN 10711023

Srituravanich, W. and Durant, S. and Lee, H. and Sun, C. and Zhang, X.. (2005) Deep subwavelength nanolithography using localized surface plasmon modes on planar silver mask. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 23 (6). pp. 2636-2639. ISSN 0734211X

T

Truong, Tu T. and Lin, Rongsheng and Jeon, Seokwoo and Lee, Hee Hyun and Maria, Joana and Gaur, Anshu and Hua, Feng and Meinel, Ines and Rogers, John A.. (2007) Soft Lithography Using Acryloxy Perfluoropolyether Composite Stamps. Langmuir, 23 (5). p. 2898. ISSN 0743-7463

W

Watkins, James J.. (2011) Roll-to-Roll Manufacturing of Nanostructured Materials and Devices. In: Nanomanufacturing Summit 2011, September 25 - 27, 2011, Boston, MA. (Unpublished)

Wei, Ming and Fang, L and Lee, J and Somu, S and Xiong, XG and Barry, C and Busniana, A and Mead, J. (2009) Directed Assembly of Polymer Blends Using Nanopatterned Templates. Advanced Materials, 21 (7). p. 794. ISSN 09359648

Winterton, Jeffrey D and Myers, David R. and Lippmann, Julian M. and Pisano, Albert P. and Doyle, Fiona M.. (2008) A novel continuous microfluidic reactor design for the controlled production of high-quality semiconductor nanocrystals. Journal of Nanoparticle Research, 10 (6). p. 893. ISSN 1388-0764

X

Xu, J. and Russell, T. P. and Ocko, B. M. and Checco, A.. (2011) Block copolymer self-assembly in chemically patterned squares. Soft Matter, 7 (8). pp. 3915-3919.

Xiong, Yi and Liu, Zhaowei and Zhang, Xiang. (2008) Projecting deep-subwavelength patterns from diffraction-limited masks using metal-dielectric multilayers. Applied Physics Letters, 93 (11). p. 111116. ISSN 00036951

Z

Zhou, W. and Huang, Y. and Menard, E. and Aluru, N. R. and Rogers, J. A. and Alleyne, A. G.. (2005) Mechanism for stamp collapse in soft lithography. Applied Physics Letters, 87 (25). p. 251925. ISSN 00036951

This list was generated on Mon Mar 18 22:23:59 2024 EDT.