Park, Soojin and Kim, Bokyung and Yavuzcetin, Ozgur and Tuominen, Mark T. and Russell, Thomas P.. (2008) Ordering of PS-b-P4VP on Patterned Silicon Surfaces. ACS Nano, 2 (7). pp. 1363-1370. ISSN 1936-0851
Full text not available from this repository. (Request a copy)Abstract
We demonstrate a method to fabricate high-quality patterned micelle arrays using poly(styrene-b-4-vinylpyridine) (PS-b-P4VP) block copolymer. Long-range order of the PS-b-P4VP micelle in hexagonal arrays was induced by topographic grating patterns during solvent annealing. The size and row spacing of block copolymer micelle arrays created in this way were uniform. By controlling the thickness of the polymer on the crests and in the troughs of the grating patterns, we prepared PS-b-P4VP micelle arrays having different sizes.
Item Type: | Article |
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Additional Information: | Abstract reproduced with permission. Copyright 2008 American Chemical Society |
InterNano Taxonomy: | Nanomanufacturing Processes > Self Assembly Nanoscale Objects and Nanostructured Materials > Nanostructured Materials > Block copolymers Nanomanufacturing Processes > Nanopatterning/Lithography > Block copolymer lithography Nanomanufacturing Characterization Techniques |
Collections: | Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for Hierarchical Manufacturing Nanomanufacturing Research Collection |
Depositing User: | Moureen Kemei |
Date Deposited: | 03 Feb 2010 19:06 |
Last Modified: | 19 Sep 2011 21:30 |
URI: | http://eprints.internano.org/id/eprint/254 |
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