Up a level |
Chen, Hung-Ting and Crosby, Todd A. and Park, Myoung-Hwan and Nagarajan, Sivakumar and Rotello, Vincent M. and Watkins, James J.. (2009) Accessibility of cylindrical channels within patterned mesoporous silica films using nanoparticle diffusion. Journal of Materials Chemistry, 19 (1). pp. 70-74. ISSN 0959-9428
Moran, Isaac W. and Briseno, Alejandro L. and Loser, Stephen and Carter, Kenneth R.. (2008) Device Fabrication by Easy Soft Imprint Nano-Lithography. Chemistry of Materials, 20 (14). pp. 4595-4601. ISSN 0897-4756
Moran, Isaac W. and Jhaveri, Sarav B. and Carter, Kenneth R.. (2008) Patterned Layers of a Semiconducting Polymer via Imprinting and Microwave-Assisted Grafting. Small, 4 (8). pp. 1176-1182. ISSN 16136810
Nagarajan, Sivakumar and Russell, Thomas P. and Watkins, James J.. (2009) Dual-Tone Patterned Mesoporous Silicate Films Templated From Chemically Amplified Block Copolymers. Advanced Functional Materials, 19 (17). pp. 2728-2734. ISSN 1616301X
Nagarajan, Sivakumar and Bosworth, Joan K. and Ober, Christopher K. and Russell, Thomas P. and Watkins, James J.. (2008) Simple Fabrication of Micropatterned Mesoporous Silica Films Using Photoacid Generators in Block Copolymers†. Chemistry of Materials, 20 (3). pp. 604-606. ISSN 0897-4756
Park, Soojin and Kim, Bokyung and Yavuzcetin, Ozgur and Tuominen, Mark T. and Russell, Thomas P.. (2008) Ordering of PS-b-P4VP on Patterned Silicon Surfaces. ACS Nano, 2 (7). pp. 1363-1370. ISSN 1936-0851
Park, Soojin and Wang, Jia-Yu and Kim, Bokyung and Xu, Ji and Russell, Thomas P.. (2008) A Simple Route to Highly Oriented and Ordered Nanoporous Block Copolymer Templates. ACS Nano, 2 (4). pp. 766-772. ISSN 1936-0851
Park, S. and Kim, B. and Wang, J.-Y. and Russell, T. P.. (2008) Fabrication of Highly Ordered Silicon Oxide Dots and Stripes from Block Copolymer Thin Films. Advanced Materials, 20 (4). pp. 681-685. ISSN 09359648
Stoykovich, Mark P. and Kang, Huiman and Daoulas, Kostas Ch. and Liu, Guoliang and Liu, Chi-Chun and de Pablo, Juan J. and Müller, Marcus and Nealey, Paul F.. (2007) Directed Self-Assembly of Block Copolymers for Nanolithography: Fabrication of Isolated Features and Essential Integrated Circuit Geometries. ACS Nano, 1 (3). p. 168. ISSN 1936-0851
Tirumala, Vijay R. and Daga, Vikram and Bosse, August W. and Romang, Alvin and Ilavsky, Jan and Lin, Eric K. and Watkins, James J.. (2008) Well-Ordered Polymer Melts with 5 nm Lamellar Domains from Blends of a Disordered Block Copolymer and a Selectively Associating Homopolymer of Low or High Molar Mass. Macromolecules, 41 (21). pp. 7978-7985. ISSN 0024-9297
Wang, Jia-Yu and Chen, Wei and Russell, Thomas P.. (2008) Ion-Complexation-Induced Changes in the Interaction Parameter and the Chain Conformation of PS-b-PMMA Copolymers. Macromolecules, 41 (13). pp. 4904-4907. ISSN 0024-9297