Park, Soojin and Yavuzcetin, Ozgur and Kim, Bokyung and Tuominen, Mark T. and Russell, Thomas P.. (2009) A Simple Top-Down/Bottom-Up Approach to Sectored, Ordered Arrays of Nanoscopic Elements Using Block Copolymers. Small, 5 (9). pp. 1064-1069. ISSN 16136810
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Official URL: http://dx.doi.org/10.1002/smll.200801573
Abstract
A top-down/bottom-up approach is demonstrated by combining electron-beam (e-beam) lithography and a solvent annealing process. Micellar arrays of polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP) with a high degree of lateral order can be produced on a surface where sectoring is defined by e-beam patterning. The e-beam is used to crosslink the block copolymer (BCP) film immediately after spin-coating when the BCP is disordered or in a highly ordered solvent-annealed film. Any patterns can be written into the BCP by crosslinking. Upon exposure to a preferential solvent for the minor component block followed by drying, cylindrical nanopores are generated within the nonexposed areas by a surface reconstruction process, while, in the exposed areas, the films remain unchanged. Nickel nanodot arrays can be placed over selected areas on a surface by thermal evaporation and lift-off process.
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | block copolymers; lithography; micelles; nanodots; nickel |
| InterNano Taxonomy: | Nanoscale Objects and Nanostructured Materials > Nanostructured Materials > Block copolymers Nanoscale Objects and Nanostructured Materials > Nanocomposites > Thin films Nanomanufacturing Processes > Nanopatterning/Lithography Nanomanufacturing Processes > Nanopatterning/Lithography > Electron-beam lithography |
| Collections: | Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for Hierarchical Manufacturing Nanomanufacturing Research Collection |
| ID Code: | 260 |
| Deposited By: | Moureen Kemei |
| Deposited On: | 08 Mar 2010 14:57 |
| Last Modified: | 19 Sep 2011 13:22 |
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