A Simple Top-Down/Bottom-Up Approach to Sectored, Ordered Arrays of Nanoscopic Elements Using Block Copolymers

Park, Soojin and Yavuzcetin, Ozgur and Kim, Bokyung and Tuominen, Mark T. and Russell, Thomas P.. (2009) A Simple Top-Down/Bottom-Up Approach to Sectored, Ordered Arrays of Nanoscopic Elements Using Block Copolymers. Small, 5 (9). pp. 1064-1069. ISSN 16136810

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A top-down/bottom-up approach is demonstrated by combining electron-beam (e-beam) lithography and a solvent annealing process. Micellar arrays of polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP) with a high degree of lateral order can be produced on a surface where sectoring is defined by e-beam patterning. The e-beam is used to crosslink the block copolymer (BCP) film immediately after spin-coating when the BCP is disordered or in a highly ordered solvent-annealed film. Any patterns can be written into the BCP by crosslinking. Upon exposure to a preferential solvent for the minor component block followed by drying, cylindrical nanopores are generated within the nonexposed areas by a surface reconstruction process, while, in the exposed areas, the films remain unchanged. Nickel nanodot arrays can be placed over selected areas on a surface by thermal evaporation and lift-off process.

Item Type: Article
Uncontrolled Keywords: block copolymers; lithography; micelles; nanodots; nickel
InterNano Taxonomy: Nanoscale Objects and Nanostructured Materials > Nanostructured Materials > Block copolymers
Nanoscale Objects and Nanostructured Materials > Nanocomposites > Thin films
Nanomanufacturing Processes > Nanopatterning/Lithography
Nanomanufacturing Processes > Nanopatterning/Lithography > Electron-beam lithography
Collections: Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for Hierarchical Manufacturing
Nanomanufacturing Research Collection
Depositing User: Moureen Kemei
Date Deposited: 08 Mar 2010 19:57
Last Modified: 19 Sep 2011 17:22
URI: http://eprints.internano.org/id/eprint/260

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