Park, S. and Kim, B. and Wang, J.-Y. and Russell, T. P.. (2008) Fabrication of Highly Ordered Silicon Oxide Dots and Stripes from Block Copolymer Thin Films. Advanced Materials, 20 (4). pp. 681-685. ISSN 09359648
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Official URL: http://dx.doi.org/10.1002/adma.200701997
Abstract
A general route to fabricate highly ordered arrays of nanoscopic silicon oxide dots and stripes (see figure) from block copolymer thin films is described. Poly(styrene-b-4-vinylpyridine) thin films with cylindrical microdomains oriented normal and parallel to the surface were used as templates for the fabrication of nanoscopic silicon oxide, with polydimethylsiloxane as the inorganic precursor.
Item Type: | Article |
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InterNano Taxonomy: | Nanomanufacturing Processes > Nanopatterning/Lithography > Block copolymer lithography Nanoscale Objects and Nanostructured Materials > Nanostructured Materials > Block copolymers Nanoscale Objects and Nanostructured Materials > Nanocomposites > Thin films Nanomanufacturing Characterization Techniques > Scanning Probe Microscopy |
Collections: | Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for Hierarchical Manufacturing Nanomanufacturing Research Collection |
Depositing User: | Moureen Kemei |
Date Deposited: | 17 Feb 2010 19:03 |
Last Modified: | 19 Sep 2011 20:45 |
URI: | http://eprints.internano.org/id/eprint/282 |
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