Park, S. and Kim, B. and Wang, J.-Y. and Russell, T. P.. (2008) Fabrication of Highly Ordered Silicon Oxide Dots and Stripes from Block Copolymer Thin Films. Advanced Materials, 20 (4). pp. 681-685. ISSN 09359648
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Official URL: http://dx.doi.org/10.1002/adma.200701997
Abstract
A general route to fabricate highly ordered arrays of nanoscopic silicon oxide dots and stripes (see figure) from block copolymer thin films is described. Poly(styrene-b-4-vinylpyridine) thin films with cylindrical microdomains oriented normal and parallel to the surface were used as templates for the fabrication of nanoscopic silicon oxide, with polydimethylsiloxane as the inorganic precursor.
| Item Type: | Article |
|---|---|
| InterNano Taxonomy: | Nanomanufacturing Processes > Nanopatterning/Lithography > Block copolymer lithography Nanoscale Objects and Nanostructured Materials > Nanostructured Materials > Block copolymers Nanoscale Objects and Nanostructured Materials > Nanocomposites > Thin films Nanomanufacturing Characterization Techniques > Scanning Probe Microscopy |
| Collections: | Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for Hierarchical Manufacturing Nanomanufacturing Research Collection |
| Depositing User: | Moureen Kemei |
| Date Deposited: | 17 Feb 2010 19:03 |
| Last Modified: | 19 Sep 2011 20:45 |
| URI: | http://eprints.internano.org/id/eprint/282 |
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