Fresco, Zachary M. and Suez, Itai and Backer, Scott A. and Fréchet, Jean M. J.. (2004) AFM-Induced Amine Deprotection: Triggering Localized Bond Cleavage by Application of Tip/Substrate Voltage Bias for the Surface Self-Assembly of Nanosized Dendritic Objects. Journal of the American Chemical Society, 126 (27). pp. 8374-8375. ISSN 0002-7863
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Official URL: http://dx.doi.org/10.1021/ja047774q
Abstract
An α,α-dimethyl-3,5-dimethoxybenzyloxycarbonyl (DDZ)-protected amine monolayer can be selectively deprotected by the application of a voltage bias from a conducting AFM tip to afford localized nanoscale patterns that can be visualized by self-assembly of dendritic molecular objects with terminal carboxylic acid groups and different aspect ratios.
| Item Type: | Article |
|---|---|
| Additional Information: | Reprinted with permission from "AFM-Induced Amine Deprotection: Triggering Localized Bond Cleavage by Application of Tip/Substrate Voltage Bias for the Surface Self-Assembly of Nanosized Dendritic Objects", Fresco ZM et al., Journal of the American Chemical Society., 126 (27), pp 8374–8375. Copyright 2004 American Chemical Society. |
| InterNano Taxonomy: | Nanomanufacturing Processes > Self Assembly > Self-assembled monolayers (SAM) Nanomanufacturing Characterization Techniques > Scanning Probe Microscopy > Atomic force microscopy (AFM) Nanomanufacturing Processes > Nanopatterning/Lithography |
| Collections: | Nanomanufacturing Research Collection |
| ID Code: | 334 |
| Deposited By: | Moureen Kemei |
| Deposited On: | 10 Mar 2010 15:40 |
| Last Modified: | 10 Mar 2010 15:40 |
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