AFM-Induced Amine Deprotection: Triggering Localized Bond Cleavage by Application of Tip/Substrate Voltage Bias for the Surface Self-Assembly of Nanosized Dendritic Objects

Fresco, Zachary M. and Suez, Itai and Backer, Scott A. and Fréchet, Jean M. J.. (2004) AFM-Induced Amine Deprotection: Triggering Localized Bond Cleavage by Application of Tip/Substrate Voltage Bias for the Surface Self-Assembly of Nanosized Dendritic Objects. Journal of the American Chemical Society, 126 (27). pp. 8374-8375. ISSN 0002-7863

Full text not available from this repository. (Request a copy)

Abstract

An α,α-dimethyl-3,5-dimethoxybenzyloxycarbonyl (DDZ)-protected amine monolayer can be selectively deprotected by the application of a voltage bias from a conducting AFM tip to afford localized nanoscale patterns that can be visualized by self-assembly of dendritic molecular objects with terminal carboxylic acid groups and different aspect ratios.

Item Type: Article
Additional Information: Reprinted with permission from "AFM-Induced Amine Deprotection: Triggering Localized Bond Cleavage by Application of Tip/Substrate Voltage Bias for the Surface Self-Assembly of Nanosized Dendritic Objects", Fresco ZM et al., Journal of the American Chemical Society., 126 (27), pp 8374–8375. Copyright 2004 American Chemical Society.
InterNano Taxonomy: Nanomanufacturing Processes > Self Assembly > Self-assembled monolayers (SAM)
Nanomanufacturing Characterization Techniques > Scanning Probe Microscopy > Atomic force microscopy (AFM)
Nanomanufacturing Processes > Nanopatterning/Lithography
Collections: Nanomanufacturing Research Collection
Depositing User: Moureen Kemei
Date Deposited: 10 Mar 2010 20:40
Last Modified: 10 Mar 2010 20:40
URI: http://eprints.internano.org/id/eprint/334

Actions (login required)

View Item View Item