Chemical patterning for the highly specific and programmed assembly of nanostructures

Kannan, Balaji and Kulkarni, Rajan P. and Satyanarayana, Srinath and Castelino, Kenneth and Majumdar, Arun. (2005) Chemical patterning for the highly specific and programmed assembly of nanostructures. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 23 (4). pp. 1364-1370. ISSN 0734211X

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Abstract

We have developed a new chemical patterning technique based on standard lithography-based processes to assemble nanostructures on surfaces with extraordinarily high selectivity. This patterning process is used to create patterns of aminosilane molecular layers surrounded by highly inert poly (ethylene glycol) (PEG) molecules. While the aminosilane regions facilitate nanostructure assembly, the PEG coating prevents adsorption of molecules and nanostructures, thereby priming the semiconductor substrate for the highly localized and programmed assembly of nanostructures. We demonstrate the power and versatility of this manufacturing process by building multilayered structures of gold nanoparticles attached to molecules of DNA onto the aminosilane patterns, with zero nanocrystal adsorption onto the surrounding PEG regions. The highly specific surface chemistry developed here can be used in conjunction with standard microfabrication and emerging nanofabrication technology to seamlessly integrate various nanostructures with semiconductor electronics.

Item Type: Article
InterNano Taxonomy: Nanomanufacturing Processes > Assembly Techniques > Supermolecular chemical assembly
Nanoscale Objects and Nanostructured Materials > Nanodevice Structures > Nanoelectronic circuits and architectures
Nanomanufacturing Processes > Nanopatterning/Lithography
Collections: Nanomanufacturing Research Collection
Depositing User: Moureen Kemei
Date Deposited: 22 Mar 2010 20:29
Last Modified: 22 Mar 2010 20:29
URI: http://eprints.internano.org/id/eprint/351

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