Stuart, Colin and Xu, Qianfei and Tseng, Ricky J. and Yang, Yang and Hahn, H. Thomas and Chen, Yong and Wu, Wei and Williams, R. Stanley. (2006) Nanofabrication module integrated with optical aligner. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 24 (2). pp. 539-542. ISSN 10711023Full text not available from this repository. (Request a copy)
In this article, we describe a simple module that can be integrated with a commercial optical aligner for nanoimprint lithography or optical lithography. The module provides a convenient low-cost technique to transform an optical aligner for microfabrication into a nanofabrication machine. This combination enables the creation of nanoscale features and alignment of multiple-layer lithographic patterns with submicron accuracy within one instrument. Imprinting of 30 nm half-pitch lines has been demonstrated by the module, as well as submicron alignment. The module has also been used to fabricate micro- and nanoscale patterns simultaneously by the combination of optical and imprint lithography.
|InterNano Taxonomy:||Nanomanufacturing Processes > Nanopatterning/Lithography
|Collections:||Nanomanufacturing Research Collection|
|Depositing User:||Moureen Kemei|
|Date Deposited:||24 Mar 2010 20:17|
|Last Modified:||24 Mar 2010 20:17|
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