Rolandi, Marco and Suez, Itai and Scholl, Andreas and Fréchet, Jean M. J.. (2007) Fluorocarbon Resist for High-Speed Scanning Probe Lithography. Angewandte Chemie International Edition, 46 (39). pp. 7477-7480. ISSN 14337851
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Official URL: http://dx.doi.org/10.1002/anie.200701496
Abstract
Quick as a flash: High-speed scanning probe lithography in perfluorooctane leads to direct deposition of fluorinated amorphous carbon at velocities in the cm s-1 range. Features as small as 27 nm are fabricated on 100-m2 areas within seconds. The nanoscale patterns are characterized by using photoelectron emission microscopy and secondary ion mass spectrometry.
| Item Type: | Article |
|---|---|
| InterNano Taxonomy: | Nanoscale Objects and Nanostructured Materials > Nanocomposites > Thin films Nanomanufacturing Processes > Nanopatterning/Lithography > Atomic force probe writing Nanomanufacturing Processes > Nanopatterning/Lithography |
| Collections: | Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for Scalable and Integrated Nanomanufacturing |
| Depositing User: | Moureen Kemei |
| Date Deposited: | 29 Mar 2010 19:42 |
| Last Modified: | 30 Sep 2014 15:02 |
| URI: | http://eprints.internano.org/id/eprint/378 |
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