Fluorocarbon Resist for High-Speed Scanning Probe Lithography

Rolandi, Marco and Suez, Itai and Scholl, Andreas and Fréchet, Jean M. J.. (2007) Fluorocarbon Resist for High-Speed Scanning Probe Lithography. Angewandte Chemie International Edition, 46 (39). pp. 7477-7480. ISSN 14337851

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Quick as a flash: High-speed scanning probe lithography in perfluorooctane leads to direct deposition of fluorinated amorphous carbon at velocities in the cm s-1 range. Features as small as 27 nm are fabricated on 100-m2 areas within seconds. The nanoscale patterns are characterized by using photoelectron emission microscopy and secondary ion mass spectrometry.

Item Type: Article
InterNano Taxonomy: Nanoscale Objects and Nanostructured Materials > Nanocomposites > Thin films
Nanomanufacturing Processes > Nanopatterning/Lithography > Atomic force probe writing
Nanomanufacturing Processes > Nanopatterning/Lithography
Collections: Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for Scalable and Integrated Nanomanufacturing
Depositing User: Moureen Kemei
Date Deposited: 29 Mar 2010 19:42
Last Modified: 30 Sep 2014 15:02
URI: http://eprints.internano.org/id/eprint/378

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