Xiong, Yi and Liu, Zhaowei and Zhang, Xiang. (2008) Projecting deep-subwavelength patterns from diffraction-limited masks using metal-dielectric multilayers. Applied Physics Letters, 93 (11). p. 111116. ISSN 00036951
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Official URL: http://dx.doi.org/10.1063/1.2985898
Abstract
We utilize a metal-dielectric multilayer structure to generate deep-subwavelength one-dimensional and two-dimensional periodic patterns with diffraction-limited masks. The working wavelength and the pattern are set by the flexible design of the multilayer structure. This scheme is suitable to be applied to deep-subwavelength photolithography. As an example, we numerically demonstrate pattern periods down to 50 nm under 405 nm light illumination.
| Item Type: | Article |
|---|---|
| InterNano Taxonomy: | Nanoscale Objects and Nanostructured Materials > Nanocomposites > Thin films Nanomanufacturing Processes > Nanopatterning/Lithography |
| Collections: | Nanomanufacturing Research Collection |
| Depositing User: | Moureen Kemei |
| Date Deposited: | 07 Apr 2010 19:09 |
| Last Modified: | 07 Apr 2010 19:09 |
| URI: | http://eprints.internano.org/id/eprint/413 |
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