Projecting deep-subwavelength patterns from diffraction-limited masks using metal-dielectric multilayers

Xiong, Yi and Liu, Zhaowei and Zhang, Xiang. (2008) Projecting deep-subwavelength patterns from diffraction-limited masks using metal-dielectric multilayers. Applied Physics Letters, 93 (11). p. 111116. ISSN 00036951

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Abstract

We utilize a metal-dielectric multilayer structure to generate deep-subwavelength one-dimensional and two-dimensional periodic patterns with diffraction-limited masks. The working wavelength and the pattern are set by the flexible design of the multilayer structure. This scheme is suitable to be applied to deep-subwavelength photolithography. As an example, we numerically demonstrate pattern periods down to 50 nm under 405 nm light illumination.

Item Type: Article
InterNano Taxonomy: Nanoscale Objects and Nanostructured Materials > Nanocomposites > Thin films
Nanomanufacturing Processes > Nanopatterning/Lithography
Collections: Nanomanufacturing Research Collection
Depositing User: Moureen Kemei
Date Deposited: 07 Apr 2010 19:09
Last Modified: 07 Apr 2010 19:09
URI: http://eprints.internano.org/id/eprint/413

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