Sulfur as a Novel Nanopatterning Material: An Ultrathin Resist and a Chemically Addressable Template for Nanocrystal Self-Assembly

Germain, Jonathan and Rolandi, Marco and Backer, Scott A. and Fréchet, Jean M. J.. (2008) Sulfur as a Novel Nanopatterning Material: An Ultrathin Resist and a Chemically Addressable Template for Nanocrystal Self-Assembly. Advanced Materials, 20 (23). pp. 4526-4529. ISSN 09359648

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Abstract

Nanoscale tip-induced polymerization of a sulfur thin film affords a simple negative tone resist that can be used as mask for substrate etching in fluorinated solutions or as a chemical template for the directed self-assembly of gold nanocrystals.

Item Type: Article
InterNano Taxonomy: Nanoscale Objects and Nanostructured Materials > Nanocomposites > Thin films
Nanomanufacturing Processes > Nanopatterning/Lithography
Collections: Nanomanufacturing Research Collection
Depositing User: Moureen Kemei
Date Deposited: 12 Apr 2010 14:55
Last Modified: 12 Apr 2010 14:55
URI: http://eprints.internano.org/id/eprint/421

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