Germain, Jonathan and Rolandi, Marco and Backer, Scott A. and Fréchet, Jean M. J.. (2008) Sulfur as a Novel Nanopatterning Material: An Ultrathin Resist and a Chemically Addressable Template for Nanocrystal Self-Assembly. Advanced Materials, 20 (23). pp. 4526-4529. ISSN 09359648
Full text not available from this repository. (Request a copy)
Official URL: http://dx.doi.org/10.1002/adma.200802024
Abstract
Nanoscale tip-induced polymerization of a sulfur thin film affords a simple negative tone resist that can be used as mask for substrate etching in fluorinated solutions or as a chemical template for the directed self-assembly of gold nanocrystals.
Item Type: | Article |
---|---|
InterNano Taxonomy: | Nanoscale Objects and Nanostructured Materials > Nanocomposites > Thin films Nanomanufacturing Processes > Nanopatterning/Lithography |
Collections: | Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for Scalable and Integrated Nanomanufacturing |
Depositing User: | Moureen Kemei |
Date Deposited: | 12 Apr 2010 14:55 |
Last Modified: | 26 Sep 2014 21:30 |
URI: | http://eprints.internano.org/id/eprint/421 |
Actions (login required)
View Item |