Large-Area Dense Plasmonic Nanoarrays for Surface Enhanced Raman Applications

Liberman, Vladimir and Yilmaz, C. and Bloomstein, T. M. and Rothschild, M. and Somu, Sivasubramanian and Echegoyen, Y. and Busnaina, Ahmed A.. (2010) Large-Area Dense Plasmonic Nanoarrays for Surface Enhanced Raman Applications. In: New England Nanomanufacturing Summit 2010, June 22 - 24, 2010, Lowell, MA. (Unpublished)

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Abstract

Despite the interesting fundamental science of SERS, the promise of the technique as the basis for portable chemical sensors has not been fully realized yet. The reason for this gap between the science and engineering lies in the formidable nanofabrication challenges, which can be summed up as the need to prepare large numbers of very small yet highly controlled “hot spots” for the sensing device. In this work, we will describe newly-developed techniques for forming dense periodic two-dimensional plasmonic arrays for SERS sensing applications. These techniques utilize 157-nm interference lithography on a 90-nm pitch grid for 1) direct patterning of Ag nanocones and 2) convective assembly of Au nanoparticles into pre-patterned PMMA templates. Both fabrication methods result in a high areal density of plasmonic nano-gap “hot spots.” These arrays were used to achieve area-averaged Raman enhancement factor of adsorbed benzenethiol of ≥5 x 106. The fabrication process employed here is scalable to large areas, and therefore it can enable the manufacturing of highly sensitive chemical sensors that detect the greatly enhanced Raman scattering signal.

Item Type: Conference or Workshop Item (Paper)
InterNano Taxonomy: Nanomanufacturing Characterization Techniques > Optical Spectroscopy > Raman spectroscopy
Nanomanufacturing Processes > Nanopatterning/Lithography > Colloidal crystal template lithography
Nanomanufacturing Processes > Self Assembly > Colloidal crystallization
Nanomanufacturing Processes > Nanopatterning/Lithography > Plasmonic lithography
Collections: National Nanomanufacturing Network Archive > Conferences and Workshops > New England Nanomanufacturing Summit 2010
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Depositing User: Robert Stevens
Date Deposited: 02 Jul 2010 13:58
Last Modified: 02 Jul 2010 13:58
URI: http://eprints.internano.org/id/eprint/519

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