High-Speed Maskless Photolithography for Customized Nanomanufacturing

Smith, Henry I. and Walsh, Michael E. and Zhang, Feng and Ferrera, J. and Menon, Rajesh. (2010) High-Speed Maskless Photolithography for Customized Nanomanufacturing. In: New England Nanomanufacturing Summit 2010, June 22 - 24, 2010, Lowell, MA. (Unpublished)

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Abstract

Achieving high functionality in nanoscale assemblies will require means of deterministically introducing structural complexity. Lithography represents the most effective technology currently at our disposal for creating such structural complexity. In research and in nanomanufacturing, flexibility as well as reasonable throughput and high resolution, are required. For lithographic patterning, photons have numerous advantages over charged particles. Even the disadvantage of lower resolution may soon be circumvented. The maskless photolithography system under development at LumArray Inc., and our plans for future extensions to the deep sub-100nm domain, will be described.

Item Type: Conference or Workshop Item (Paper)
InterNano Taxonomy: Nanomanufacturing Processes > Nanopatterning/Lithography > Advanced photolithography
Nanomanufacturing Processes > Nanopatterning/Lithography
Nanomanufacturing Characterization Techniques > Other Characterization Techniques > Scanning interferometric apertureless microscope
Collections: National Nanomanufacturing Network Archive > Conferences and Workshops > New England Nanomanufacturing Summit 2010
Related URLs:
Depositing User: Robert Stevens
Date Deposited: 02 Jul 2010 14:14
Last Modified: 02 Jul 2010 14:14
URI: http://eprints.internano.org/id/eprint/521

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