Kwak, M. K. and Ok, J. G. and Lee, J. Y. and Guo, L. J.. (2012) Continuous Phase-shift Lithography with a Roll-type Mask and Application to Transparent Conductor Fabrication. Nanotechnology, 23 (34). p. 344008.
Full text not available from this repository.Abstract
We report the development of a near-field optical nanolithography method using a roll-type phase-shift mask. Sub-wavelength resolution is achieved using near-field exposure of photoresist through a cylindrical phase mask, allowing dynamic and high throughput continuous patterning. As an application, we present the fabrication of a transparent electrode in the form of a metallic wire grid by using the roller-based optical lithography method. To fabricate a mesh-type metal pattern, a specific phase-shift mask was designed and critical experimental parameters were also studied. As a result, a transparent conductor with suitable properties was achieved with a recently built cylindrical phase-shift lithography prototype designed to pattern on 100?mm 2 of substrate area.
| Item Type: | Article |
|---|---|
| Collections: | Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for Hierarchical Manufacturing |
| Depositing User: | Robert Stevens |
| Date Deposited: | 26 Mar 2014 |
| Last Modified: | 26 Mar 2014 19:43 |
| URI: | http://eprints.internano.org/id/eprint/2057 |
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