Correction to Photocleavable Triblock Copolymers Featuring an Activated Ester Middle Block: ``One-Step'' Synthesis and Application as Locally Reactive Nanoporous Thin Films

Zhao, H. and Gu, W. and Kakuchi, R. and Sun, Z. and Sterner, E. and Russell, T. P. and Coughlin, E. B. and Theato, P.. (2014) Correction to Photocleavable Triblock Copolymers Featuring an Activated Ester Middle Block: ``One-Step'' Synthesis and Application as Locally Reactive Nanoporous Thin Films. ACS Macro Letters, 3 (2). p. 204.

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Item Type:	Article
Collections:	Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for Hierarchical Manufacturing
Depositing User:	Robert Stevens
Date Deposited:	19 Aug 2015 21:29
Last Modified:	19 Aug 2015 21:29
URI:	http://eprints.internano.org/id/eprint/2303

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