Resonator- and Filter-Induced Slow Waves for High-Sensitivity RF Interferometer Operations

Chen, Z. and Shao, Y. Z. and Wang, P. S.. (2015) Resonator- and Filter-Induced Slow Waves for High-Sensitivity RF Interferometer Operations. Ieee Sensors Journal, 15 (5). pp. 2993-2999.

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Abstract

Resonators and filters have engineered radio-frequency (RF) spectrums and dispersions, which induce slow waves for increased local RF field intensities and prolonged field propagations. When used for sensors, the interactions between RF waves and material-under-test (MUT) can be significantly strengthened due to enhanced RF fields and longer interaction time when compared with uniform transmission lines. In this paper, a microstrip resonator (MR) and a coupled line (CL) filter are designed and incorporated into an interferometer. The obtained results are compared with that of a coplanar waveguide-based interferometer. Both simulated and measured results show that the MR and CL can significantly enhance RF interferometer sensitivity, e.g., by >5 times of frequency shift and up to 40-dB more of transmission coefficient change similar to 2 GHz. Further work is needed to fully understand the physical processes and obtain quantitative MUT permittivity properties from the measured scattering parameters.

Item Type: Article
Additional Information: ISI Document Delivery No.: CF5VFTimes Cited: 1Cited Reference Count: 25Chen, Zhe Shao, Yongzhi Wang, PingshanCenter for Hierarchical Manufacturing, National Science Foundation, through Division of Chemistry 1152892This work was supported by the Center for Hierarchical Manufacturing, National Science Foundation, through the Division of Chemistry under Grant 1152892. The associate editor coordinating the review of this paper and approving it for publication was Dr. Francis P. Hindle.1Ieee-inst electrical electronics engineers incPiscataway1558-1748
Uncontrolled Keywords: Physics
Collections: Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for Hierarchical Manufacturing
Depositing User: Robert Stevens
Date Deposited: 12 Nov 2015 18:38
Last Modified: 12 Nov 2015 18:38
URI: http://eprints.internano.org/id/eprint/2326

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