Ofir, Yuval and Samanta, Bappaditya and Xiao, Qijun and Jordan, Brian J. and Xu, Hao and Arumugam, Palaniappan and Arvizo, Rochelle and Tuominen, Mark T. and Rotello, Vincent M.. (2008) Polyelectrolyte Negative Resist Patterns as Templates for the Electrostatic Assembly of Nanoparticles and Electroless Deposition of Metallic Films. Advanced Materials, 20 (13). pp. 2561-2566. ISSN 09359648
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Official URL: http://dx.doi.org/10.1002/adma.200703095
Abstract
Electron-beam lithography is used to pattern either cationic polyvinyl N-methyl pyridine or anionic sulfonated polystyrene polymers, that act as negative resists, to produce templates for electroless deposition and the electrostatic assembly of metallic, magnetic, or semiconductor nanoparticles.
| Item Type: | Article |
|---|---|
| InterNano Taxonomy: | Nanoscale Objects and Nanostructured Materials > Nanostructured Materials Nanoscale Objects and Nanostructured Materials > Nanocomposites > Thin films Nanomanufacturing Processes > Nanopatterning/Lithography > Electron-beam lithography |
| Collections: | Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for Hierarchical Manufacturing Nanomanufacturing Research Collection |
| Depositing User: | Moureen Kemei |
| Date Deposited: | 22 Feb 2010 20:57 |
| Last Modified: | 19 Sep 2011 20:45 |
| URI: | http://eprints.internano.org/id/eprint/259 |
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