Wang, Yuan and Srituravanich, Werayut and Sun, Cheng and Zhang, Xiang. (2008) Plasmonic Nearfield Scanning Probe with High Transmission. Nano Letters, 8 (9). pp. 3041-3045. ISSN 1530-6984
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Nearfield scanning optical microscopy (NSOM) offers a practical means of optical imaging, optical sensing, and nanolithography at a resolution below the diffraction limit of the light. However, its applications are limited due to the strong attenuation of the light transmitted through the subwavelength aperture. To solve this problem, we report the development of plasmonic nearfield scanning optical microscope with an efficient nearfield focusing. By exciting surface plasmons, plasmonic NSOM probes are capable of confining light into a 100 nm spot. We show by nearfield lithography experiments that the intensity at the near field is at least one order stronger than the intensity obtained from the conventional NSOM probes under the same illumination condition. Such a high efficiency can enable plasmonic NSOM as a practical tool for nearfield lithography, data storage, cellular visualization, and many other applications requiring efficient transmission with high resolution.
| Item Type: | Article |
|---|---|
| Additional Information: | Reprinted with permission from "Plasmonic Nearfield Scanning Probe with High Transmission", Wang Y et al., Nano Lett., 2008, 8 (9), pp 3041–3045. Copyright 2008 American Chemical Society |
| Uncontrolled Keywords: | Optical Imaging |
| InterNano Taxonomy: | Nanomanufacturing Characterization Techniques > Scanning Probe Microscopy > Near-field scanning optical microscopy (NSOM) |
| Collections: | Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for Scalable and Integrated Nanomanufacturing |
| Depositing User: | Moureen Kemei |
| Date Deposited: | 07 Apr 2010 16:01 |
| Last Modified: | 26 Sep 2014 21:24 |
| URI: | http://eprints.internano.org/id/eprint/412 |
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