Kim, Tae-Gon and Yoo, Young-Sam and Kim, Tae-Geun and Ahn, Jinho and Lee, Jong-Myoung and Choi, Jae-Sung and Busnaina, Ahmed A. and Park, Jin-Goo. (2008) Damage Free Particle Removal from Extreme Ultraviolet Lithography Mask Layers by High Energy Laser Shock Wave Cleaning. In: 20th International Microprocesses and Nanotechnology Conference, Nov 05-08, 2007, Kyoto, Japan.
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Official URL: http://dx.doi.org/10.1143/JJAP.47.4886
| Item Type: | Conference or Workshop Item (Paper) |
|---|---|
| Uncontrolled Keywords: | laser shock wave cleaning, mask cleaning |
| InterNano Taxonomy: | Nanoscale Objects and Nanostructured Materials > Nanocomposites > Thin films |
| Collections: | Nanomanufacturing Research Collection |
| Depositing User: | Moureen Kemei |
| Date Deposited: | 12 May 2010 15:14 |
| Last Modified: | 12 May 2010 15:14 |
| URI: | http://eprints.internano.org/id/eprint/461 |
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