SELVARASAH, S and CHAO, S and CHEN, C and SRIDHAR, S and BUSNAINA, A and KHADEMHOSSEINI, A and DOKMECI, M. (2008) A reusable high aspect ratio parylene-C shadow mask technology for diverse micropatterning applications. Sensors and Actuators A: Physical, 145-146. p. 306. ISSN 09244247
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Official URL: http://dx.doi.org/10.1016/j.sna.2007.10.053
| Item Type: | Article |
|---|---|
| InterNano Taxonomy: | Nanomanufacturing Processes |
| Collections: | Nanomanufacturing Research Collection > Nanomanufacturing Nanoscale Science and Engineering Centers > Center for High-rate Nanomanufacturing |
| Depositing User: | Amulya Gullapalli |
| Date Deposited: | 17 Jul 2011 19:07 |
| Last Modified: | 17 Jul 2011 19:07 |
| URI: | http://eprints.internano.org/id/eprint/993 |
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