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Sun, Z. W. and Chen, Z. B. and Zhang, W. X. and Choi, J. and Huang, C. L. and Jeong, G. J. and Coughlin, E. B. and Hsu, Y. T. and Yang, X. M. and Lee, K. Y. and Kuo, D. S. and Xiao, S. G. and Russell, T. P.. (2015) Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template. Advanced Materials, 27 (29). pp. 4364-4370.