Nanoimprint Technology for Large Area Patterning and Its Applications

Lee, JaeJong and Lee, SangRok. (2010) Nanoimprint Technology for Large Area Patterning and Its Applications. In: New England Nanomanufacturing Summit 2010, June 22 - 24, 2010, Lowell, MA. (Unpublished)

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The era of nanotechnology is already emerging in the 21st century. With the recognition of nanotechnology as one of the future strategic technologies, the R&D efforts have been performed under exclusive supports of governments and private sectors. At present, nanotechnology is at the focus of research and public attention in almost every advanced country including USA, Japan, and many others in EU. Keeping tracks of such technical trends, center for nanoscale mechatronics and manufacturing (CNMM) was established in 2002 as a part of national nanotechnology promotion policy led by ministry of science and technology (MOST) in Korea. CNMM aims for development of mass producible advanced nano-processes and corresponding nanofabrication equipments capable of producing nano-products in the range of 10nm ~ 100nm faster, smarter, and cheaper. It will hold widespread potential applications in electronics, optical electronics, biotechnology, micro systems, etc, with the promises of commercial visibility and competitiveness.

Item Type: Conference or Workshop Item (Paper)
InterNano Taxonomy: Nanomanufacturing Processes > Nanopatterning/Lithography > Extreme ultraviolet (EUV) lithography
Nanomanufacturing Processes > Nanopatterning/Lithography > Interference lithography
Nanomanufacturing Processes > Nanopatterning/Lithography
Collections: National Nanomanufacturing Network Archive > Conferences and Workshops > New England Nanomanufacturing Summit 2010
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Depositing User: Robert Stevens
Date Deposited: 02 Jul 2010 11:52
Last Modified: 02 Jul 2010 16:33

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